Shadow Effect and Its Revisal in Grid-Enhanced Plasma Source with Ion Implantation Method

The implanting voltage, gas pressure and the grid electrode radius are the key parameters influencing the surfacegrid shadow effect that has been observed in our grid-enhanced plasma source ion implantation experiment. To reduce the shadow effect and obtain a corresponding better implantation uniformity of sample surfaces, we needto use lower implanting voltage, higher gas pressure and smaller grid radius. Furthermore, we apply an axialmagnetic field to increase the plasma density inside the tube and to mix the plasma outside the grid, so that theshadow effect of sample surfaces can be weakened.