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Mass Spectrometry Investigation on Decamethylcyclopentasiloxane Electron Cyclotron Resonance Plasma for SiCOH Film Deposition
作者姓名:张海燕  叶超  宁兆元
作者单位:School of Physics Science and Technology, Key Laboratory of Thin Films, Soochow University, Suzhou 215006
基金项目:Supported by the National Natural Science Foundation of China under Grant No 10575074, and the Specialized Research Fund for the Doctoral Programme of Higher Education of China under Grant No 20050285007.
摘    要:We investigate the fragmentation behaviour of decamethylcyclopentasiloxane (DMCPS) plasma using a quadrupole mass spectrometry, which is used as the precursor to deposit SiCOH film in an electron cyclotron resonance (ECR) plasma system. The structure of DMCPS molecules comprises a fivefold Si-O ring and ten -CH3 groups bonded at five Si atoms. In ECR discharge plasma, the main fragmentation behaviour of DMCPS includes two stages. One is the breaking of fivefold Si-O rings and then the formation of threefold Si-O rings and Si-O chain species. The other is the decomposing of hydrocarbon groups from Si atoms and then the crosslink of hydrocarbon species. Combined with the bonding configuration of SiCOH films, the relation between species in ECR plasma and films structures is analysed.

关 键 词:电子回旋加速器  共振等离子体  十甲基环五硅氧烷  SiCOH薄膜  光谱测定法
收稿时间:2007-08-16

Mass Spectrometry Investigation on Decamethylcyclopentasiloxane Electron Cyclotron Resonance Plasma for SiCOH Film Deposition
ZHANG Hai-Yan,YE Chao,NING Zhao-Yuan.Mass Spectrometry Investigation on Decamethylcyclopentasiloxane Electron Cyclotron Resonance Plasma for SiCOH Film Deposition[J].Chinese Physics Letters,2008,25(2):636-639.
Authors:ZHANG Hai-Yan  YE Chao  NING Zhao-Yuan
Institution:School of Physics Science and Technology, Key Laboratory of Thin Films, Soochow University, Suzhou 215006
Abstract:We investigate the fragmentation behaviour of decamethylcyclopentasiloxane (DMCPS) plasma using a quadrupole mass spectrometry, which is used as the precursor to deposit SiCOH film in an electron cyclotron resonance (ECR) plasma system. The structure of DMCPS molecules comprises a fivefold Si--Oring and ten -CH3 groups bonded at five Si atoms. In ECR discharge plasma, the main fragmentation behaviour of DMCPS includes two stages. One is the breaking of fivefold Si--O rings and then the formation of threefold Si--O rings and Si--O chain species. The other is the decomposing of hydrocarbon groups from Si atoms and then the crosslink of hydrocarbon species. Combined with the bonding configuration of SiCOH films, the relation between species in ECRplasma and films structures is analysed.
Keywords:52  70  Nc  82  33  Xj  78  30  Am
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