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Surface States in the AlxGa1-xN Barrier in AlxGa1-xN/GaN Heterostructures
引用本文:刘杰 沈波 王茂俊 周玉刚 陈敦军 张荣 施毅 郑有Dou.Surface States in the AlxGa1-xN Barrier in AlxGa1-xN/GaN Heterostructures[J].中国物理快报,2004,21(1):170-172.
作者姓名:刘杰  沈波  王茂俊  周玉刚  陈敦军  张荣  施毅  郑有Dou
作者单位:NationalLaboratoryofSolidStateMicrostructuresandDepartmentofPhysics,NanjingUniversity,Nanjing210093
摘    要:Frequency-dependent capacitance-voltage (C-V) measurements have been performed on modulation-doped Al0.22 Ga0.78N/GaN heterostructures to investigate the characteristics of the surface states in the AlxGa1-xN barrier. Numerical fittings based on the experimental data indicate that there are surface states with high density locating on the AlxGa1-xN barrier. The density of the surface states is about 10^12cm^-2eV^-1, and the time constant is about 1μs. It is found that an insulating layer (Si3N4) between the metal contact and the surface of AlxGa1-xN can passlvate the surface states effectively.

关 键 词:异质结  氮化镓  表面态  半导体材料  电容-电压测量  掺杂
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