首页 | 本学科首页   官方微博 | 高级检索  
     检索      

Time—Resolved Photoluminescence Studies of AlInGaN Alloys
引用本文:董逊,黄劲松,黎大兵,刘祥林,徐钟英,王占国.Time—Resolved Photoluminescence Studies of AlInGaN Alloys[J].中国物理快报,2003,20(7):1148-1150.
作者姓名:董逊  黄劲松  黎大兵  刘祥林  徐钟英  王占国
作者单位:[1]KeyLaboratoryofSemiconductorMaterials,InstituteofSemiconductors,ChineseAcademyofSciences,Beijing100083 [2]StateKeyLaboratoryforSuperltticesandMicrostructures,InstituteofSemiconductors,ChineseAcademyofSciences,Beijing100083
摘    要:We study the two samples of AlInGaN,i.e.,1-μm Gan grown at 1030℃ on the buffer and followed by a 0.6μm-thick epilayer of AlInGaN under the low pressure of 76 Torr and the AlInGaN layer deposited diectly on the buffer layer without the high-temperature GaN layer,by temperature-dependent photoluminescence(PL) spectroscopy and picosecond time-resolved photoluminescence(TRPL) spectroscopy.The TRPL signals of both the samples were fitted well as a stretched exponential decay at all temperatures,indicating significant disorder in the material.We attribute the disorder to nanoscale quantum dots or discs of high indium concentration.Temperature dependence of dispersive exponent β shows that the stretched exponential decay of the two samples comes from dfferent mechanisms.The different depths of the localization potential account for the difference,which is illustrated by the results of temperature dependence of radiative recombination lifetime and PL peak energy.

关 键 词:AlInGaN合金  铝铟镓氮合金  光致发光光谱  光学性质  化合物半导体
本文献已被 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号