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Monolithic integration of electroabsorption modulator and DFB laser for 10-Gb/s transmission
Authors:Q Zhao  JQ Pan  J Zhang  BX Li  F Zhou  BJ Wang  LF Wang  J Bian  LJ Zhao  W Wang
Institution:

National Research Center of Optoelectronics Technology, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, PR China

Abstract:A strained InGaAsP-InP multiple-quantum-well DFB laser monolithically integrated with electroabsorption modulator by ultra-low-pressure (22 mbar) selective-area-growth is presented. The integrated chip exhibits superior characteristics, such as low threshold current of 19 mA, single-mode operation around 1550 nm range with side-mode suppression ratio over 40 dB, and larger than 16 dB extinction ratio when coupled into a single-mode fiber. More than 10 GHz modulation bandwidth is also achieved. After packaged in a compact module, the device successfully performs 10-Gb/s NRZ transmission experiments through 53.3 km of standard fiber with 8.7 dB dynamic extinction ratio. A receiver sensitivity of −18.9 dBm at bit-error-rate of 10−10 is confirmed.
Keywords:DFB laser  Electroabsorption modulator  Multiple quantum well
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