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Application of high-resolution electron microscopy for visualization and quantitative analysis of strain fields in heterostructures
Authors:A K Gutakovskii  A L Chuvilin  S A Song
Institution:(1) Institute of Semiconductor Physics, Siberian Division, Russian Academy of Sciences, pr. Akademika Lavrent’eva 13, Novosibirsk, 630090, Russia;(2) University of Ulm, Albert-Einstein Alee 11, D-89081 Ulm, Germany;(3) Analytical Engineering Center, Samsung Advanced Institute of Technology, P.O. Box 111, Suwon, 440-600, Korea
Abstract:The general principles, possibilities, and limitations of the classical geometric phase method have been considered. A new generalizing approach, implying analysis of all available spatial frequencies of a high-resolution electron microscopy image, is developed to expand the possibilities of the geometric phase method. Test models of strained Si-GeSi-Si heterostructures are developed and the effect of scattering by phonons and the surface amorphous layer on visualization of lattice distortions is studied within these models. A simple method is proposed for measuring elastic strains in multicomponent heterostructures with pseudomorphic layers.
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