Formation of the polycrystalline FeSi phase with the CsCl structure in codeposited thin Fe x Si1 ? x films ( x = 0.5–0.6)

Specific features of the phase formation in the Fe-Si system within the Fe _x Si_{1 − x} (x = 0.5–0.6) concentration range have been investigated. The data obtained by conversion electron M?ssbauer spectroscopy suggest that, for the Fe-Si system in the concentration range x > 0.55, a polycrystalline FeSi phase with the CsCl structure is formed under thermodynamically equilibrium conditions upon annealing at T = 250°C; in this case, the excess (overstoichiometric) Fe atoms are incorporated into the Si sublattice. Previously, the CsCl-FeSi phase was observed only in epitaxially stabilized FeSi/Si(100) layers. Original Russian Text ? A.V. Zenkevich, D.E. Lauer, V.P. Filippov, 2007, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2007, Vol. 71, No. 9, pp. 1313–1315.