Effect of substrates on the properties of p-type ZnO films |
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Authors: | XD Zhang HB Fan J Sun Y Zhao |
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Institution: | aInstitute of Photo-Electronics Thin Film Devices and Technique of Nankai University, Tianjin 300071, PR China;bCollege of Information Engineering, Hebei University of Technology, Tianjin 300130, PR China |
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Abstract: | Influence of substrates on the properties of p-type ZnO films, which were fabricated by N–Al co-doping technique, was studied. Hall measurement results indicated that ZnO films deposited on common glass substrate were p-type conductivity when Zn:N:Al atomic ratio amounts to 1:3:0.1. However, ZnO films deposited on corning 7059 glass substrate showed n-type conductivity. Secondary ion mass spectroscopy demonstrated that Na content incorporated into ZnO films deposited on common glass substrate was more evident than that of corning 7059 glass. In addition, Hall mobility and conductivity of p-type ZnO thin films deposited on silicon substrate were improved largely. |
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Keywords: | p-type Co-doping Ultrasonic spray pyrolysis |
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