Metallization of DNA on silicon surface |
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Authors: | Anastasiya Olegovna Puchkova Petr Sokolov Yuri Vladimirovich Petrov Nina Anatolievna Kasyanenko |
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Institution: | (1) Department of Molecular Biophysics, Faculty of Physics, St. Petersburg State University, Petergof, St. Petersburg, Russia, 198504;(2) Interdisciplinary Resource Center for Nanotechnology of St. Petersburg State University, Petergof, St. Petersburg, Russia, 198504 |
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Abstract: | New simple way for silver deoxyribonucleic acid (DNA)-based nanowires preparation on silicon surface was developed. The electrochemical
reduction of silver ions fixed on DNA molecule provides the forming of tightly matched zonate silver clusters. Highly homogeneous
metallic clusters have a size about 30 nm. So the thickness of nanowires does not exceed 30–50 nm. The surface of n-type silicon
monocrystal is the most convenient substrate for this procedure. The comparative analysis of DNA metallization on of n-type
silicon with a similar way for nanowires fabrication on p-type silicon, freshly cleaved mica, and glass surface shows the
advantage of n-type silicon, which is not only the substrate for DNA fixation but also the source of electrons for silver
reduction. Images of bound DNA molecules and fabricated nanowires have been obtained using an atomic force microscope and
a scanning ion helium microscope. DNA interaction with silver ions in a solution was examined by the methods of ultraviolet
spectroscopy and circular dichroism. |
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