Pixel-based partially coherent image method for maskless lithography system |
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Authors: | Zhaojun Shi Yiqing Gao |
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Institution: | 1. NanJing University of Aeronautics and Astronautics, Nanjing, Jiangsu 210016, China;2. Key Laboratory of Nondestructive Test (Ministry of Education), NanChang HangKong University, Nanchang, Jiangxi 330063, China |
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Abstract: | Maskless lithography (ML) provides a fast and low-cost method for projecting the images of IC or micro features onto photoresist. However, it needs an efficient simulation method to evaluate the performance of lithography process. In this paper, a pixel-based partially coherent image method for digital micro-mirror device (DMD) based ML is proposed based on the linear invariant theory. In our method, the mask is sampled by DMD pixel (each pixel corresponding to each micro-mirror) and expressed by rect function. Using the shift theory of Fourier transform and the stacked pupil operator approach, we build a matrix Φ for system response function of rect function. If the DMD pixel state matrix is S, then the aerial image can be calculated with two matrix multiplication I(x,y) = SΦ. |
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Keywords: | Maskless lithography (ML) Digital micro-mirror device Pixel Matrix multiplication |
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