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高速H2+离子轰击C靶诱发二次电子的发射行为与入射角的关系
引用本文:卢其亮,周筑颖,施立群,赵国庆.高速H2+离子轰击C靶诱发二次电子的发射行为与入射角的关系[J].中国物理 B,2005,14(7):1465-1470.
作者姓名:卢其亮  周筑颖  施立群  赵国庆
作者单位:National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093,China;Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433, China;Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433, China;Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433, China;Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433, China
摘    要:运用Monte-Carlo方法结合半经验理论研究了高速H2+离子轰击C靶诱发二次电子的发射行为与入射角的关系。分别研究了电子发射产额与入射角以及发射统计性与入射角的关系。结果表明,由于H2+上的价电子的影响使得背向电子发射产额不遵守余弦倒数关系。斜入射时候的前向与背向电子产额的比值跟正入射时的情况不同。电子的发射统计跟入射角没有关系。标志偏离Poission分布的值 b,随入射能量的增加而增大。

关 键 词:二次电子发射  入射角  Monte-Carlo模拟  价电子  统计分布
收稿时间:2004-07-12
修稿时间:3/4/2005 12:00:00 AM

Incident angle dependence of secondary electron emission from carbon induced by swift H2+
Lu Qi-Liang,Zhou Zhu-Ying,Shi Li-Qun and Zhao Guo-Qing.Incident angle dependence of secondary electron emission from carbon induced by swift H2+[J].Chinese Physics B,2005,14(7):1465-1470.
Authors:Lu Qi-Liang  Zhou Zhu-Ying  Shi Li-Qun and Zhao Guo-Qing
Institution:Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433, China; National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093,China;Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433, China
Abstract:The incident angle dependence of secondary electron emission induced by a swift H$_{2}^{+}$ ion impinging on carbon is studied using the Monte Carlo method combined with the semiempirical theory. The relationships both between the electron emission yield and the project angle and between the statistics and the projectile angle are investigated. The results show that the backward electron emission yield deviates from the inverse cosine law, due to the effect of the valence electrons of H$_{2}^{+}$. The ratio of the forward electron emission yield to the backward electron emission yield at the inclining incidence is different from that at the normal incidence. The statistical distribution of electron emission is independent of the incident angle. The value of $b$, the deviation parameter from the Poisson distribution, increases with projectile energy.
Keywords:secondary electron emission  incidence angle  Monte-Carlo simulation  valence electron  statistical distribution
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