| Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing |
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| 作者姓名： | 王永谦 廖显伯 刁宏伟 张世斌 徐艳月 陈长勇 陈维德 孔光临 |
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| 作者单位： | State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China;State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China |
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| 基金项目： | Project supported by the National Natural Science Foundation of China (Grant Nos 69976028 and 29890217), and the State Key Development Programme for Basic Research of China (Grant No 2000028201). |
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| 摘 要： | A novel pulsed rapid thermal processing (PRTP) method has been used for realizing solid-phase crystallization of amorphous silicon films prepared by plasma-enhanced chemical vapour deposition.The microstructure and surface morphology of the crystallized films were investigated using x-ray diffraction and atomic force microscopy.The results indicate that PRTP is a suitable post-crystallization technique for fabricating large-area polycrystalline silicon films with good structural quality,such as large grain size,small lattice microstrain and smooth surface morphology on low-cost glass substrates.
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| 关 键 词： | 硅薄膜 结构特性 热处理 |
| 收稿时间： | 2001-06-27 |
Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing |
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| Wang Yong-Qian,Liao Xian-Bo,Diao Hong-Wei,Zhang Shi-Bin,Xu Yan-Yue,Chen Chang-Yong,Chen Wei-De and Kong Guang-Lin.Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing[J].Chinese Physics B,2002,11(5):492-495. |
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| Authors: | Wang Yong-Qian Liao Xian-Bo Diao Hong-Wei Zhang Shi-Bin Xu Yan-Yue Chen Chang-Yong Chen Wei-De and Kong Guang-Lin |
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| Institution: | State Key Laboratory for Surface Physics, Institute of Semiconductors and Centre for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China |
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| Abstract: | A novel pulsed rapid thermal processing (PRTP) method has been used for realizing solid-phase crystallization of amorphous silicon films prepared by plasma-enhanced chemical vapour deposition. The microstructure and surface morphology of the crystallized films were investigated using x-ray diffraction and atomic force microscopy. The results indicate that PRTP is a suitable post-crystallization technique for fabricating large-area polycrystalline silicon films with good structural quality, such as large grain size, small lattice microstrain and smooth surface morphology on low-cost glass substrates. |
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| Keywords: | polycrystalline silicon film rapid thermal processing microstructure |
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