微米/纳米相结合的三维金属铝图案

利用光刻，反应离子刻蚀以及电化学阳极氧化技术在铝基底上构建出了微米纳米相结合的三维金属铝图案。首先在铝片的表面形成一层具有图案的二氧化硅阻碍层，阳极氧化过程中，在二氧化硅阻碍层之下会形成侧向生长的倾斜孔道和残留的金属铝微结构。形成机制可阐述为：由于表面二氧化硅阻碍层的存在造成局域电场方向的偏折，影响到反应过程中离子的输运，从而导致侧向倾斜孔的形成，而在远离阻碍层的区域孔道则会正常垂直表面向下生长。这种垂直与侧向阳极腐蚀的同时进行导致在二氧化硅阻碍层之下形成了金属铝微结构。

Three-dimensional micro- and nanometre composite aluminium patterns

Three-dimensional micro- and nanometre composite aluminium patterns are constructed on Al substrate by using photolithography, reactive ion etching and anodization. A layer of patterned SiO$_{2}$ mask is introduced as resist on the surface of Al foil, and during anodization the tilted nanopores and remaining Al microstructure are formed underneath the SiO$_{2}$ mask. The existence of SiO$_{2}$ mask leads to the deflection of electric field and effect on the transportation of ions, which results in the formation of laterally tilted nanopores, while the nanopores go down directly when being far from the boundaries of SiO$_{2}$. The vertical and lateral anodization processes proceeding simultaneously construct the Al microstructure under the patterned SiO$_{2}$ mask.