| 低能Cu13团簇沉积薄膜的分子动力学模拟研究 |
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| 引用本文： | 张世旭,刘惠伟,贺亦文,张梅玲,李公平.低能Cu13团簇沉积薄膜的分子动力学模拟研究[J].原子核物理评论,2019,36(2):235-241. |
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| 作者姓名： | 张世旭 刘惠伟 贺亦文 张梅玲 李公平 |
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| 作者单位： | 1.兰州大学核科学与技术学院, 兰州 730000; |
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| 基金项目： | 国家自然科学基金资助项目（11604129）；兰州大学中央高校基本科研业务费专项资金资助项目（lzujbky-2015-67，lzujbky-2019-56） |
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| 摘 要： | 利用分子动力学模拟方法对Cu13团簇在Fe（001）表面上沉积薄膜进行了研究，分析了不同沉积条件对薄膜生长模式的影响，对比分析了不同沉积条件下表面粗糙度、缺陷分布和外延度等薄膜性质的差异。Cu13团簇的初始沉积能量范围为0.1~10.0 eV/atom，沉积率为1.0 clusters/ps，衬底温度分别为300，700和1 000 K。模拟结果表明:团簇初始沉积能量主要影响薄膜生长模式，当初始沉积能量为7.5 eV/atom的Cu13团簇沉积到温度为300 K的Fe（001）表面时，可形成表面光滑、内部缺陷少和较好外延度的高质量Cu薄膜。
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| 关 键 词： | 分子动力学模拟 团簇沉积薄膜 Cu13团簇 Fe (001)表面 |
| 收稿时间： | 2018-09-15 |
Molecular Dynamics Simulation Study on the Film Formation by Low Energy Cu13 Clusters Deposition |
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| Institution: | 1.School of Nuclear Science and Technology, Lanzhou University, Lanzhou 730000, China;2.Key Laboratory of Design of Special Function Materials and Structures Ministry of Education, Lanzhou University, Lanzhou 730000, China |
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| Abstract: | The formation of Cu film on Fe (001) surface by depositing Cu13 clusters was investigated via the molecular dynamics simulation. The incident energy range of Cu13 clusters was from 0.1 to 10.0 eV/atom, and the deposition rate was 1 clusters/ps. The temperature of substrate was 300, 700 and 1 000 K, respectively. The effects of incident energy of cluster and substrate temperature on the growth mode, surface roughness, defects distribution and epitaxy degree of film were studied. The simulation results show that the incident energy of Cu13 clusters plays a dominant role in the growth mode of film. In addition, when the incident energy of Cu13 clusters is 7.5 eV/atom and the substrate temperature is 300 K, the Cu film formed on Fe(001) surface is smoother, few defects and better epitaxy degree. |
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