| 0.35 μm分步重复投影光刻物镜设计 |
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| 引用本文： | 林妩媚,王效才.0.35 μm分步重复投影光刻物镜设计[J].光学学报,2000,20(8):148-1150. |
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| 作者姓名： | 林妩媚 王效才 |
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| 作者单位： | 中国科学院光电技术研究所,成都,610209 |
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| 摘 要： | 介绍０．３５μｍ分步重复投影光刻物镜的设计要点，包括数值孔径、结构形式的确定、材料的选择。介绍了光刻物镜设计的难点、创新点及设计结果。
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| 关 键 词： | 光刻物镜 分步重复投影 衍射极限 集成电路 |
| 收稿时间： | 1999/1/4 |
Design of 0.35 μm Step-and-Repeat Projection Lithography Objective |
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| Lin Wumei,Wang Xiaocai.Design of 0.35 μm Step-and-Repeat Projection Lithography Objective[J].Acta Optica Sinica,2000,20(8):148-1150. |
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| Authors: | Lin Wumei Wang Xiaocai |
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| Abstract: | The main points of design of 0.35 μm step-and-repeat projection lithography objective are introduced such as the determination of number aperture and structure model and the selection of material. The difficulties, novel design and a design result of lithography objective are discussed. |
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| Keywords: | photoetching objectives step and repeat projection diffraction limit |
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