| 连续微光学元件在光刻胶上的面形控制 |
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| 引用本文： | 曾红军,杜春雷,王永茹,白临波,邓启凌,陈波,郭履容,袁景和.连续微光学元件在光刻胶上的面形控制[J].光学学报,2000,20(5):91-696. |
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| 作者姓名： | 曾红军 杜春雷 王永茹 白临波 邓启凌 陈波 郭履容 袁景和 |
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| 作者单位： | 1. 中国科学院光电所微细加工光学技术国家重点实验室,成都,610209
2. 四川大学信息光学研究中心,成都,610064 |
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| 基金项目： | 国家科委“九五”攻关项目资助 |
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| 摘 要： | 介绍了连续微光学元件在光刻胶上的面形控制方法。分析了光刻胶及显影液在制人和二元和连续元件中所存在差别；导出具有倒易关系的浮雕深度表达式和适用的范围，并以此指导面形的控制，对光刻胶进行适当的发行以适应连续微光学元件的制作。本文还给出实验验证，制作了多种质量优良的微光学元件，并对典型元件的面形进行了评价。
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| 关 键 词： | 连续微光学元件 光刻胶线性 面形控制 集成电路 |
| 收稿时间： | 1998/11/9 |
Profile Control of Continuous Relief MOE in Photoresist |
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| Zeng Hongjun,Du Chunlei,Wang Yongru,Bai Linbo,Deng Qiling,Chen Bo,Guo Lürong,Yuan Jinghe.Profile Control of Continuous Relief MOE in Photoresist[J].Acta Optica Sinica,2000,20(5):91-696. |
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| Authors: | Zeng Hongjun Du Chunlei Wang Yongru Bai Linbo Deng Qiling Chen Bo Guo Lürong Yuan Jinghe |
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| Abstract: | The method on profile- control of micro- optic element in photoresist was present- ed.The difference between fabrication of binary optic element and that of continuous- relief MOE may not be ignored.A reciprocal equation among the depth,exposure,density of the developer and its etching time was inferred,with the appropriate conditions that proved to be useful for the MOE fabrications.The property and treatment of the photoresist were modi- fied in order to meet the conditions of the reciprocal equation.As the result,some MOEs having accurate depth and good surface performance,with the evaluation of a typical ele- ment,were shown. |
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| Keywords: | continuous micro- optic element linear property of photoresist reciprocal e- quation profile control |
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