| 微加工中一种新型刻蚀深度实时检测系统 |
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| 引用本文： | 赵光兴.微加工中一种新型刻蚀深度实时检测系统[J].光学学报,1997,17(6):45-749. |
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| 作者姓名： | 赵光兴 |
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| 作者单位： | 华东冶金学院自动化系，浙江大学光科系现代光学仪器国家重点实验室 |
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| 摘 要： | 实现了一种新型刻蚀深度实时检测系统，整个系统对温度漂移，气体流动与外界振动等环境因素极不敏感，系统测量误差小于０．９８％，实现了在真空环境下刻蚀深度的实时监视与检测，对二元光学做加工具有现实意义。
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| 关 键 词： | 微加工 离子束刻蚀 刻蚀深度 实时检测 |
| 收稿时间： | 1995/12/10 |
A Novel Real Time Etching Depth Testing System for Micro Fabrication |
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| Zhao Guangxing,Cheng Hongqiu,Hou Xiyun,Cheng Shangyi,Yang Guoguang.A Novel Real Time Etching Depth Testing System for Micro Fabrication[J].Acta Optica Sinica,1997,17(6):45-749. |
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| Authors: | Zhao Guangxing Cheng Hongqiu Hou Xiyun Cheng Shangyi Yang Guoguang |
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| Institution: | Zhao Guangxing 1 Cheng Hongqiu 2 Hou Xiyun 2 Cheng Shangyi 2 Yang Guoguang 2 1. Department of Industrial Automation,East China Institute of Metallurgy,Maanshan 243002 2. Department of Optical Engineering,Zhejiang University,Hangzhou |
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| Abstract: | A novel real time system for etching depth measurement is demostrated. The system is not sensitive to instability, temperature variation and gaseous flow. The measurement error is small than 0.98%. We realized the real time test of etching depth in vavuum environment. This has practical significance to binary optics micro fabrication. |
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| Keywords: | binary optics ion beam etching |
| 本文献已被 CNKI 维普 等数据库收录！ |
