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XeCl(308nm)脉冲准分子激光淀积类金刚石薄膜
引用本文:李铁军,刘晶儒,王丽戈.XeCl(308nm)脉冲准分子激光淀积类金刚石薄膜[J].光学学报,1997,17(3):31-337.
作者姓名:李铁军  刘晶儒  王丽戈
作者单位:西北核技术研究所高功率准分子激光实验室
摘    要:利用XeCl(308nm)脉冲准分子激光淀积技术在功率密度5×108W/cm2、室温、真空度10-3Pa的条件下,制备出不含氢成分的类金刚石薄膜,研究了类金刚石薄膜的特性及其随制备工艺条件的变化规律。研究了激光诱导的碳等离子体发射光谱,探讨了类金刚石薄膜的形成机理。

关 键 词:类金刚石  薄膜  激光  脉冲激光淀积
收稿时间:1996/2/4

Pulsed Laser Deposition of Diamond Like Carbon Film with XeCl (308 nm) Laser
Li Tiejun,Liu Jingru,Wang Lige.Pulsed Laser Deposition of Diamond Like Carbon Film with XeCl (308 nm) Laser[J].Acta Optica Sinica,1997,17(3):31-337.
Authors:Li Tiejun  Liu Jingru  Wang Lige
Abstract:Hydrogen free Diamond Like Carbon (DLC) films have been deposited by XeCl(308 nm) pulsed laser ablation of graphite targets with a base pressure of only 1×10 -3 Pa. The deposition process is performed with a laser power density of 5×10 8 W/cm 2 at room temperature. Properties of the films and the effects of a variety of process parameters on the film properties have been investigated. The emission spectra of laser induced plasma and the key factors in the process of DLC film deposition are discussed.
Keywords:diamond  like carbon film    XeCl laser    pulsed laser deposition    
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