| 基于一种新微细加工技术的亚波长光栅的研制 |
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| 引用本文： | 李以贵,陈迪,朱军,杨春生,金森义明.基于一种新微细加工技术的亚波长光栅的研制[J].光学学报,2002,22(8):008-1010. |
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| 作者姓名： | 李以贵 陈迪 朱军 杨春生 金森义明 |
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| 作者单位： | 1. 上海交通大学微纳米科学技术研究院,上海,200030
2. 日本东北大学机械电子系,日本宫城县仙台市,980-7985 |
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| 摘 要： | 描述了一种新的亚波长光栅的微细加工技术，即电子束（EB）扫描曝光得到相应的亚微米级的线宽图形，再利用快速原子束刻蚀设备获得了高深宽比的立体结构。用此加工技术获得了100nm以下的刻蚀精度，并研制成功亚波长光栅。该亚微米线宽微细加工技术可用于布拉格光栅、半导体激光器、无反射表面等需要亚微米结构的器件中。
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| 关 键 词： | 微细加工技术 研制 电子束扫描曝光 快速原子束刻蚀 亚波长光栅 |
| 收稿时间： | 2001/7/2 |
Sub-Wavelength Gratings Based on a New Microfabrication Technology |
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| Li Yigui Chen Di Zhu Jun Yang Chunsheng Kanamori Y ,Research Institute of Micro/Nanometer Sceience and Technology,Shanghai Jiaotong University,Shanghai.Sub-Wavelength Gratings Based on a New Microfabrication Technology[J].Acta Optica Sinica,2002,22(8):008-1010. |
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| Authors: | Li Yigui Chen Di Zhu Jun Yang Chunsheng Kanamori Y Research Institute of Micro/Nanometer Sceience and Technology Shanghai Jiaotong University Shanghai |
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| Institution: | Li Yigui 1) Chen Di 1) Zhu Jun 1) Yang Chunsheng Kanamori Y 2) 1),Research Institute of Micro/Nanometer Sceience and Technology,Shanghai Jiaotong University,Shanghai 200030 2),Department of Mechnical Electronic,Tohoku Un |
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| Abstract: | A new microfabrication method--electron beam scanning exposure and fast atom beam etching--to fabricate sub wavelength gratings is described. 100 nm line width period structures and gratings can be obtained by this process. It can be applied in the devices with sub microns structures such as Bragg gratings, semiconductor laser and anti reflection surfaces. |
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| Keywords: | electron beam scanning exposure fast atom beam etching sub wavelength gratings |
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