|
|||||
|
|
| 用锌有机源和CO2/H2混合气源PECVD沉积ZnO薄膜 | |
| 引用本文： | 张萌,王应民,徐鹏,蔡莉,李禾,程国安,刘庭芝.用锌有机源和CO2/H2混合气源PECVD沉积ZnO薄膜[J].光学学报,2006,26(4):39-640. |
| 作者姓名： | 张萌 王应民 徐鹏 蔡莉 李禾 程国安 刘庭芝 |
| 作者单位： | 1. 南昌大学材料科学与工程学院,南昌,330047 2. 南昌大学材料科学与工程学院,南昌,330047;南昌航空工业学院材料科学与工程学院,南昌,330034 3. 南昌航空工业学院材料科学与工程学院,南昌,330034 4. 北京师范大学材料系,北京,100871 |
| 基金项目： | 江西省自然科学基金 , 江西省材料科学与工程中心资助项目 , 江西省教育厅科研项目 |
| 摘 要： | 在等离子体作用下,以CO2/H2混合气为氧源,Zn(C2H5)2锌为锌源,在单晶硅上生长出高度择优取向的氧化锌薄膜。X射线衍射分析表明,薄膜为六方结构,c轴高度择优;原子力显微镜观察到晶粒是有规律地按六方排布,薄膜的表面粗糙度较小;从光致发光谱还发现在380 nm处有非常强的紫外峰。 |
| 关 键 词： | 薄膜光学 ZnO 等离子体增强化学气相沉积 |
| 文章编号： | 0253-2239（2006）04-0639-2 |
| 收稿时间： | 2005-11-14 |
| 修稿时间： | 2005-12-04 |
ZnO Thin Films Prepared by PECVD from Mixture Sources of Metalorganic Zinc and Carbon Dioxide-Hydrogen Gas |
|
| Zhang Meng,Wang Yingmin,Xu Peng,Cai Li,Li He,Cheng Guo'an,Liu Tingzhi.ZnO Thin Films Prepared by PECVD from Mixture Sources of Metalorganic Zinc and Carbon Dioxide-Hydrogen Gas[J].Acta Optica Sinica,2006,26(4):39-640. | |
| Authors: | Zhang Meng Wang Yingmin Xu Peng Cai Li Li He Cheng Guo'an Liu Tingzhi |
| Abstract: | ZnO films are prepared by plasma enhanced chemical vapor deposition(PECVD),using carbon dioxide-hydrogen gas and diethylzinc gas as reactant sources.Carbon dioxide reacts with hydrogen in the plasma charmer to produce oxygen source.Crystallographic properties and surface morphology of the films are characterized by X-ray diffraction(XRD) and atomic force microscopy(AFM).The results indicate that the wurtzite structure of ZnO thin films with a strong c-axis orientation is successfully deposited on Si substrate.AFM images show that the grains arrange regularly and roughness of the surface is very small.A type emission peak at 380 nm of ZnO is also observed from photoluminescence(PL) spectrum. |
| Keywords: | thin film optics ZnO plasma enhanced chemical vapor deposition(PECVD) |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |