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紫外刻划光栅母版及二代版衍射特性的模拟与分析
引用本文:朱洪春,巴音贺希格.紫外刻划光栅母版及二代版衍射特性的模拟与分析[J].光学学报,2007,27(7):151-1155.
作者姓名:朱洪春  巴音贺希格
作者单位:1. 中国科学院,长春光学精密机械与物理研究所,长春,130033;中国科学院研究生院,北京,100039
2. 中国科学院,长春光学精密机械与物理研究所,长春,130033
基金项目:国家自然科学基金(60478034),中国科学院“优秀博士学位论文、院长奖获得者科研启动专项资金”(O72031G070),“十一五”国家科技支撑计划重大项目(2006BAK03A02)资助课题
摘    要:运用微分理论对刻线密度为1200 lp/mm的紫外刻划光栅母版及其二代复制版的衍射特性做了模拟,指出了二者之间存在的差异,并与测试结果做了对照。数值模拟表明,紫外刻划光栅二代复制版的衍射特性与其母版略有不同,原因是光栅槽形发生了改变,分别给出了采用多项式拟合槽形函数和傅里叶级数拟合槽形函数的方法。此理论分析方法为澄清光栅复制工艺中的争议完善翻版技术以及寻找提高紫外光栅衍射效率的途径提供了很好的理论参考依据。

关 键 词:衍射与光栅  紫外刻划光栅  复制光栅  衍射特性  微分法
文章编号:0253-2239(2007)07-1151-5
收稿时间:2006/10/10
修稿时间:2006-10-10

Analysis and Simulation of Diffraction Characteristics of the Ultraviolet Ruled Grating Master and the Second Duplicate
Zhu Hongchun,Bayanheshig.Analysis and Simulation of Diffraction Characteristics of the Ultraviolet Ruled Grating Master and the Second Duplicate[J].Acta Optica Sinica,2007,27(7):151-1155.
Authors:Zhu Hongchun  Bayanheshig
Institution:1. Changchun Institute of Optics, Fine Mechanics and Physics, the Chinese Academy of Sciences, Changchun 130033; 2.Graduate University of Chinese Academy of Sciences, Beijing 100039
Abstract:The diffraction characteristics of 1200 lp/mm ultraviolet ruled grating master and the second duplicate were simulated by differential theory and distinguished.The simulation results mere compared with the tested results.The numerical simulation indicated that the diffraction characteristics of the ultraviolet ruled grating master and the second duplicate are slightly different for the change of grating groove profiles.The methods of grating groove profile polynomial fitting and Fourier series fitting are presented.This theoretical analysis clarified the dispute in the diffraction grating duplication craft,perfected reprint technology and offered practical theoretical reference for improving diffraction grating efficiency.
Keywords:diffraction and grating  ultraviolet ruled grating  replica grating  diffraction characteristic  differential theory
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