| 双层光学薄膜参数的多入射角椭偏分析方法 |
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| 引用本文： | 张瑞智,罗晋生.双层光学薄膜参数的多入射角椭偏分析方法[J].光学学报,1989,9(1):5-80. |
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| 作者姓名： | 张瑞智 罗晋生 |
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| 作者单位： | 西安交通大学电子工程系
(张瑞智，罗晋生)，西安交通大学电子工程系(陈敏麒) |
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| 摘 要： | 本文讨论了多入射角椭偏测量中光学参数的误差因子以及最佳测量条件的选取.指出,当薄膜较厚时,多入射角椭偏测量可以精确确定膜系的光学常数和几何厚度,并用二例实测结果加以证实.本文的方法也适用于分析多层光学薄膜.
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| 关 键 词： | 多层薄膜 薄膜参数 多入射角椭偏 |
A Method for multiple angle of incidence ellipsometic analysis in determination of double-layer optical thin film parameters |
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| ZHANG EUIZIJI LUO JINSHEN CHEN MIQI.A Method for multiple angle of incidence ellipsometic analysis in determination of double-layer optical thin film parameters[J].Acta Optica Sinica,1989,9(1):5-80. |
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| Authors: | ZHANG EUIZIJI LUO JINSHEN CHEN MIQI |
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| Abstract: | A method for multiple angle of incidence (MAI) ellipsometric analysis in determination of double-layer optical thin film parameters is described. The error factory and the choice of the optimal measurement conditions of optical thin film parpmeters in MAI ellipsometric analysis are dicussed. It is showed that the method enables the determination of all the optical parameters and thickness of double-layer film system with a high accuracy if the systems are of sufficient thickness. This fact is illustrated with the samples of Si/SiO2/Si3N4 and Si/SiO2/poly-Si systems. The method can be extended to analyzing the mutilayer optical thin film systems. |
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| Keywords: | multiple-angle ellipsometry film parameter double layer films |
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