| 聚合物纳米孔隙增透膜制备工艺的研究 |
| |
| 引用本文： | 杨振宇,朱大庆,赵茗,金曦,孙涛.聚合物纳米孔隙增透膜制备工艺的研究[J].光学学报,2006,26(1):52-156. |
| |
| 作者姓名： | 杨振宇 朱大庆 赵茗 金曦 孙涛 |
| |
| 作者单位： | 华中科技大学激光技术国家重点实验室,武汉,430074 |
| |
| 基金项目： | 国家自然科学基金(60107001)资助课题 |
| |
| 摘 要： | 论述了聚合物纳米孔隙增透膜的制备工艺流程,分析了聚合物材料分子量、实验环境温度和湿度、溶剂挥发性等条件对纳米孔隙增透膜的影响。研究表明,聚合物材料分子量的增大、温度的降低、湿度的升高以及采用挥发性弱的溶剂都将导致增透膜孔隙尺寸的增大,孔隙越大其对光的散射损耗就会增大,所以增透膜的透过率就越低。通过大量的试验分析得出一组较理想的工艺参量:使用低分子量的聚合物材料(小于15 kg/mol),环境温度大于25℃、环境相对湿度小于30%,在采用低沸点的溶剂如四氢呋喃等措施下可有效降低增透膜散射损耗。
|
| 关 键 词： | 薄膜光学 纳米材料 增透膜 纳米孔隙薄膜 制备工艺 |
| 文章编号： | 0253-2239（2006）01-0152-5 |
| 收稿时间： | 2005-01-10 |
| 修稿时间： | 2005-05-31 |
Fabrication of Polymer Nanoporous Antireflection Film |
| |
| Yang Zhenyu,Zhu Daqing,Zhao Ming,Jin Xi,Sun Tao.Fabrication of Polymer Nanoporous Antireflection Film[J].Acta Optica Sinica,2006,26(1):52-156. |
| |
| Authors: | Yang Zhenyu Zhu Daqing Zhao Ming Jin Xi Sun Tao |
| |
| Institution: | State Key Laboratory of Laser Technology, Huazhong University of Science and Technology, Wuhan 430074 |
| |
| Abstract: | The technological process of polymer nanoporous antireflection film fabrication is discussed in detail. And the effects of molecular weight of the polymer, experimental temperature, humidity and the volatility of common solvent on the polymer nanoporous antireflection film are also analyzed. Larger polymer's molecular weight, lower condition temperature, higher relative humidity and lower solvent's volatility will lead to increasing the porous size and the scattering loss. So the transmission ratio of the film will be decreased. Lower molecular weight polymer (25 ℃), relative humidity lower than 30%， and lower boiling point solvent such as tetrahydrofuran are the key points for a small porous size and high transmission ratio. |
| |
| Keywords: | film optics nanometer material antireflection film nanoporous film fabrication technique |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
