18.2nm Schwarzschild显微成像系统初步研究

叙述了Schwarzschild型正入射软X射线多层膜显微成像系统的设计、制作和成像实验，其工作波长为18．2nm，放大倍数为10．5×，极限分辨率小于0．2μm。采用Mo／Si多层膜，周期和层数分别为9．5nm和41。用激光等离子体光源对20pl／mm和55pl／mm的栅网进行了软X射线显微成像实验，所得结果表明此显微成像系统的分辨率在微米量级。

Preliminary Investigation of a Schwarzschild Microscopical System at 18. 2 nm

The design, construction and imaging experiments of a soft X-ray normalincidence multilayer imaging Schwarzschild microscopical system with 10. 5 ×magnification at 18. 2 nm are presented. The resolution limited by abberration and diffractions less than 0. 2 μm. Multilayer Mo/Si coatings were deposited simultaneously onto both mirrors of Schwarzschild objective. The period of multilayer and number of layers are 9. 5 nm and 41, respectively. The images of 20 pl/mm and 55 pl/mm mesh were taken with laser produced with this imaging microscopic system.