| 三倍频分光膜在1064 nm的破斑特性研究 |
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| 引用本文： | 崔云,赵元安,晋云霞,范正修,邵建达.三倍频分光膜在1064 nm的破斑特性研究[J].光学学报,2007,27(6):129-1134. |
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| 作者姓名： | 崔云 赵元安 晋云霞 范正修 邵建达 |
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| 作者单位： | 1. 中国科学院上海光学精密机械研究所,上海,201800;中国科学院研究生院,北京,100039
2. 中国科学院上海光学精密机械研究所,上海,201800 |
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| 摘 要： | 采用电子束蒸发方式制备了两种不同材料组合的分光膜,分别对其在波长1064 nm激光辐照下的损伤阈值进行了测试,用Alpha-Step 500台阶仪对破斑进行了深度测量。实验结果表明,破斑呈现出表面层的剥落和深坑破坏两种形态。表面层的剥落深度在一定范围内不随能量密度的变化而变化;深坑破坏深浅不一,是膜内缺陷融化、汽化及喷发的综合作用的结果,是损伤阈值降低的主要原因。
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| 关 键 词： | 薄膜光学 激光损伤阈值 破斑深度 缺陷 |
| 文章编号： | 0253-2239（2007）06-1129-6 |
| 收稿时间： | 2006/8/14 |
| 修稿时间： | 2006-08-14 |
Laser Damage Characteristic of Third Harmonic Separator at 1064 nm |
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| Cui Yun,Zhao Yuanan,Jin Yunxia,Fan Zhengxiu,Shao Jianda.Laser Damage Characteristic of Third Harmonic Separator at 1064 nm[J].Acta Optica Sinica,2007,27(6):129-1134. |
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| Authors: | Cui Yun Zhao Yuanan Jin Yunxia Fan Zhengxiu Shao Jianda |
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| Institution: | 1 Shanghai Institute of Optics and Fine Mechanics, the Chinese Academy of Scicences, Shanghai 201800; 2 Graduate School of the Chinese Academy of Sciences, Beijing 10039 |
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| Abstract: | The two kinds of 3ω harmonic separator were prepared by electron beam evaporation with different materials. Laser induced damage threshold (LIDT) was measured at 1064 nm and the damage morphologies were mapped by Alpha-Step 500 meter. It was found that there are two different damage geometries: shallow denudation and deep crater. Shallow denudation in a certain range had same depth at different energy fluences, and material was removed from the top film layers. Deep crater had different depths caused by the combination of melting vaporization and fracture of inner defects of coatings, which was the main cause for decreased damage threshold. |
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| Keywords: | thin-film optics laser induced damage threshold damage depth defect |
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