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光学系统像差与光场干涉对激光参量测量精度的影响
引用本文:高雪松,高春清,于竞,李家泽,魏光辉.光学系统像差与光场干涉对激光参量测量精度的影响[J].光学学报,2006,26(6):41-844.
作者姓名:高雪松  高春清  于竞  李家泽  魏光辉
作者单位:北京理工大学光电工程系,北京,100081
摘    要:研究了采用面阵CCD探测器测量光束参量的技术问题,研制了一套高精度激光参量测量系统,对其光学系统像差与光场干涉原因进行了理论分析,实验测量了连续抽运1064nm固体模式发生器产生的基模厄米高斯光束,分析对比了其输出光束带有干涉条纹时对测量精度的影响,对光学系统的设计提出了具体技术要求,为同类装置的研制提供了参考依据。

关 键 词:光束参量  光学系统像差  光场干涉  模式发生器  M2因子  面阵CCD
文章编号:0253-2239(2006)06-0841-4
收稿时间:2005-06-14
修稿时间:2006-01-06

Influence of Optical Interference and System Aberration on Laser Beam Parameter Measurement Precision
Gao Xuesong,Gao Chunqing,Yu Jing,Li Jiaze,Wei Guanghui.Influence of Optical Interference and System Aberration on Laser Beam Parameter Measurement Precision[J].Acta Optica Sinica,2006,26(6):41-844.
Authors:Gao Xuesong  Gao Chunqing  Yu Jing  Li Jiaze  Wei Guanghui
Institution:Department Optoelectronics, Beijing Institute of Technology, Beijing 100081
Abstract:The technical problems concerning the parameter measurement of the laser beam by using a CCD array is studied.A high-precision system for laser beam parameter measurement is developed.Its aberrations and optical interferences are analyzed in theory,and the laser beam with fundamental Gaussian mode by continuous a LD-pumped,solid-state mode generator with 1064 nm is measured.The influence of the beam output with different interference patterns on measurement precision is analyzed and compared with theoretical estimation.Then,the technical requests for designing the optical system are brought up,which provides reference for developing the similar instrument.
Keywords:beam parameter  optical aberration  optical interference  mode generator  M~2-factor  CCD array
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