A comparative study of the influence of different post-treatment methods on the properties of HfO2 single layers |
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| Authors: | Congjuan Wang Yunxia Jin Dongping Zhang Jianda Shao Zhengxiu Fan |
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| Institution: | 1. Division of Physics and Semiconductor Science, Dongguk University, Seoul 100-715, Republic of Korea;2. Institute of Physics and Applied Physics, Yonsei University, Seoul 120-749, Republic of Korea;1. Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, PR China;2. Leybold Optics GmbH, Alzenau 63755, Germany |
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| Abstract: | Heat treatment, laser conditioning and ion post-treatment were used, respectively, on HfO2 single layers deposited by electron beam evaporation (EBE). Optical, structural and laser-induced damage threshold (LIDT) properties of the films had been studied. It was found that all of the post-treatment methods are effective for improving the LIDT, but the mechanism for the improvement differs. Heat treatment in atmosphere was found to be effective for improving film stoichiometry. Laser conditioning was useful to decrease the defects by stress release. While in the ion post-treatment, the defects were removed by ion sputtering and the absorption was reduced at the effect of compression induced by ion bombardment. The most suitable method should be chosen for the required characteristics of the coatings. |
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