NbN薄膜的制备与性能研究

采用磁控溅射和直流偏压二极溅射两种方法制备了NbN薄膜。用XRD和TEM测量比较了两种不同溅射方法获得的NbN薄膜的特点，并测量了NbN薄膜的超导转变温度Tco采用两种溅射方法都得到了致密、均匀、单一δ相的多晶NbN薄膜，薄膜生长的择优取向受温度和氮气流量的影响很大，薄膜的超导转变温度受溅射室本底真空影响较大。

Fabrication and Study of Sputtered NbN Thin Films

In this work the authors discussed the fabrication of NbN thin films deposited using two methods: reactive magnetron sputtering system and DC bias-voltage sputtering system. The thickness and the surface morphology of the thin films were measured and observed by SEM. The crystalloid structure was analyzed by X-ray diffraction (XRD). The authors also measured the critical temperature (Tc) of the thin films. The authors compared the characters of NbN thin films that the authors prepared through two methods. The results showed that the films the authors prepared were uniform, compact, well constructed and sing-phase FCC delta-NbN. It is shown that the deposition temperature and the flux of N2 have a strong effect on the preferred orientation, while the critical temperature of the films is influenced by the quality of the original vacuum.