| 等离子体化学气相沉积氮化镓薄膜中的N2/TMG等离子体发射光谱分析 |
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| 引用本文： | 符斯列,王春安,陈俊芳.等离子体化学气相沉积氮化镓薄膜中的N2/TMG等离子体发射光谱分析[J].光谱学与光谱分析,2013,33(4):1108-1111. |
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| 作者姓名： | 符斯列 王春安 陈俊芳 |
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| 作者单位： | 1. 华南师范大学物理与电信工程学院，量子信息技术重点实验室，广东 广州 510006
2. 广东技术师范学院电子与信息学院，广东 广州 510665 |
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| 基金项目： | 国家自然科学基金项目(10575039);广东省自然科学基金项目(10151063101000048)资助 |
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| 摘 要： | 对电子回旋共振低温等离子体化学气相沉积工艺(ECR-PECVD)沉积GaN薄膜过程中的氮气和三甲基镓有机金属气体(TMG)混合气体等离子体发射光谱进行分析。结果表明TMG 在等离子体自加热条件下就发生离解，N2/TMG混合气体ECR等离子体主要以Ga气体粒子和亚稳态氮分子为主。发射光谱特征谱线随微波功率变化分析表明：当微波功率高于400 W时，亚稳态氮分子浓度随着微波功率的增加而增加，而高激发态氮分子以及氮分子离子浓度却随着减少。
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| 关 键 词： | 等离子体化学气相沉积 GaN 等离子体发射光谱 |
| 收稿时间： | 2012-09-03 |
Optical Emission Analyses of N2/TMG ECR Plasma for Deposition of GaN Film |
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| FU Si-lie,WANG Chun-an,CHEN Jun-fang.Optical Emission Analyses of N2/TMG ECR Plasma for Deposition of GaN Film[J].Spectroscopy and Spectral Analysis,2013,33(4):1108-1111. |
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| Authors: | FU Si-lie WANG Chun-an CHEN Jun-fang |
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| Institution: | 1. School of Physics and Communication Engineering, Laboratory of Quantum Information Technology, South China Normal University, Guangzhou 510006, China 2. School of Electronic and Information, Guangdong Polytechnic Normal University, Guangzhou 510665, China |
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| Abstract: | The optical emission spectroscopy of hybrid N2/trimethylgallium (TMG) plasma in an ECR-PECVD system was investigated. The results indicate that the TMG gas is strongly dissociated into Ga*, CH and H even under self-heating condition. Ga species and nitrogen molecule in metastable state are dominant in hybrid ECR plasma. The concentration of metastable nitrogen molecule increases with the microwave power. On the other hand, the concentration of excited nitrogen molecules and of nitrogen ion decreases when the microwave power is higher than 400 W. |
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| Keywords: | ECR-PECVD GaN OES |
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