X射线荧光光谱法表征薄膜进展

X射线荧光光谱法表征薄膜样品以其能同时测定样品的组分和厚度等优点，目前在国内外的研究和应用越来越广泛和深入。文章通过从荧光强度理论计算、基体效应和校正方法、分析误差来源及消除、定量分析软件和实际分析应用等几个方面对X射线荧光光谱法表征薄膜样品的研究作了评述。鉴于薄膜样品制备相似标样比较困难，而基本参数法采用非相似标样表征薄膜的准确度较高，因此基本参数法校正薄膜样品的应用比较广泛。重点介绍了基本参数法的荧光强度理论计算公式的发展、计算误差来源以及分析软件应用。展望了X射线荧光光谱法表征薄膜样品的应用前景和发展方向。

Analysis of Films by X-Ray Fluorescence Spectrometry

As a quantitative method of film sample, the X-ray fluorescence (XRF) technique has been used extensively because it is non-destructive, fast and accurate. Moreover it could determine the concentration and thickness of film sample simultaneously. A review was given of the study on the quantitative method of films by X-ray fluorescence spectrometry, in which the theoretical calculation of fluorescence intensity, the matrix effects and the methods for their correction, the sources of errors, the software for quantitative analysis, and the application of the method were summarized and discussed. New development and application of films characterization by X-ray fluorescence spectrometry were also expected. Because the similar calibration specimen for film sample is difficult to prepare and the fundamental parameter method could quantitatively analyze film samples even if only the pure element specimen is employed, the fundamental parameter method is studied extensively. The fundamental parameter method was introduced mainly in the present article, including the fundamental parameter equations to calculate the theoretical intensity of fluorescence, the source of error in calculation, and the software for analysis.