二维阵列狭缝阿达玛光谱仪波长准确度研究

二维阵列狭缝模板是阿达玛编码模板的一种新的设计思想，分析了模板上同列狭缝的加工误差对仪器波长准确度的不利影响，在此基础上，给出了减少同列狭缝高度、垂直光谱维方向上位置不一致性误差对仪器波长准确度影响的方法，以及同列狭缝在光谱维方向上位置不一致导致解码所得谱线产生的光谱偏移量的粗略估计方法，并建立模型进行仿真，计算了当模板上某列狭缝存在宽度、光谱维方向上位置不一致性误差时，解码所得其他各列狭缝谱线分布上测量误差的大小，根据仿真结果可以初步确定模板的加工精度。通过该研究有助于合理设计MEMS(微机电系统)二维阵列狭缝模板，获得对系统误差的有效补偿，提高仪器的波长准确度。

Study on the Wavelength Accuracy of the 2-D Slit-Array Hadamard Spectrometer

The 2-D slit array mask is a new design of Hadamard spectrometer mask. Having discussed the influence of the inconsistency caused by the machining errors in the size and location between the slits in the same column on the wavelength accuracy of the Hadamard spectrometer, the authors bring up with the way to decrease the influence on the wavelength accuracy of the spectrometer caused by the difference in the height and location vertical to the spectrum between the slits in the same column, and then estimate the spectral shift caused by the relative location shift along the spectrum between the slits in the same column. A model for simulation was built, and the measurement errors in the decoded spectrum generated by one column of the slits on the mask were calculated, when there are inconsistency errors in width and location along the spectrum between the slits in another column. Based on the simulation calculation, we can determine the machining precision of the mask. The research will be meaningful to the design of the 2-D slit array mask using MEMS(micro-electro-mechanism system) technique and the revise of the decoded spectrum, which can provide the spectrometer with a reasonable wavelength accuracy.