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强短脉冲供电辉光放电发射光谱法测定铜基合金组分的研究
引用本文:弓振斌,任建世.强短脉冲供电辉光放电发射光谱法测定铜基合金组分的研究[J].光谱学与光谱分析,1997,17(3):64-68.
作者姓名:弓振斌  任建世
作者单位:[1]厦门大学化学系 [2]中国科学院金属研究所
摘    要:文中所述的研究用实验室组装的强短脉冲供电辉光放电发射光谱(HCMSPGD-OES)实验系统,对铜基合金中的次要组分Ni,Al,Mn,Si的含量进行了测定,辉光放电(GD)源在强短脉冲供电(HCMSP)时,原子线和离子线的发射得到增强,文中选用了Ni,Al,Mn,Si的次灵敏线作分析线,对影响分析强度的因素进行了研究,在选定的实验条件下几种组分的含量进行了测定,测定结果与样品的推荐值吻合较好,六次侧

关 键 词:辉光放电  发射光谱  组分  HCMSP  铜基合金

DETERMINATION OF Ni,Al,Mn and Si IN COPPER BASED ALLOY BY HIGH CURRENT AND MICROSECOND PULSED GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRY
Z Gong,Z Zhou,P Yang,X Wnag,B Huang,J Ren,H Ma,M Chen,G Zhang.DETERMINATION OF Ni,Al,Mn and Si IN COPPER BASED ALLOY BY HIGH CURRENT AND MICROSECOND PULSED GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRY[J].Spectroscopy and Spectral Analysis,1997,17(3):64-68.
Authors:Z Gong  Z Zhou  P Yang  X Wnag  B Huang  J Ren  H Ma  M Chen  G Zhang
Institution:Department of Chemistry, Xiamen University, 361005 Xiamen.
Abstract:The determination of Ni,Al,Mn and Si in copper based alloy by high current and microsecond pulsed (HCMSP)glow discharge optical emission spectrometry(GD OES)has been reported.With the laboratory built experiment set up,the factors effecting analytical performance have been studied.The results of sample analysis are in good agreements with the recommendation values,and the stansard deviation for six determinations were 2 66% for Ni,2 17% for Mn,6 02% for Si,1 00% for Al respectively.
Keywords:High current and microsecond pulsed power supply    Glow discharge    Emission spectrometry    Copper based alloy
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