Secondary effects on solid surfaces stimulated by the cathode plasma flux in vacuum arcs

The conducting plasma region between the electrodes of a vacuum arc contains single-and multiple-charged ions of the cathode material. Investigation into the behaviour of this flux when it impinges upon a surface should take into account secondary processes. From among various processes on the surface in vacuum arc, particular attention is paid to the sputtering of the surface and to the secondary electron emission by positive ions emitted from the cathode spots. On the basis of the sputtering yield characteristicsS _r as a function of ion kinetic energyE _i and their energy distribution in the cathode flux, the total sputtering yieldsS _re for atomicaly clean surface have been determined. Experimental verification ofS _re was performed by measuring the ratio of mass deposited on the collectors to mass carried by the particle incident flux. It was found that the calculated value ofS _re is comparable to the evaluated one from the experiments. The emission of secondary electrons from clean metal surfaces due to a bombardment by multiple-charged ions is considered. The secondary electron emission _c depends on excess energyE _ex of incident ion and its average value _av for multiple-charged ions depends both on the fractional distribution of ion flux _zi and on the excess energyE _ex of each ion. It is proposed that the relationship derived is applicable to most combinations of atomic ions and pure metal surfaces.Presented at 17^th Symposium Plasma Physics and Technology, Prague, June 13–16, 1995.This work was supported by the State Committee for Scientific Research within the research project No. 3P40101507.