Effect of potantiostatic waveforms on properties of electrodeposited NiFe alloy films

The influence of the deposition potentials applied in continuous and pulse waveforms on the properties of the electrodeposited NiFe alloy films have been investigated. The films were grown on (100) textured polycrystalline copper substrates. During growth, the films were characterized by recording the current-time transients. The composition of samples was determined by inductively coupled plasma atomic emission spectrometry (ICP-AES). The analysis results revealed that the Fe content in the films decreases as both the deposition potential and the film thickness increase. The X-ray patterns showed that the films have face centred cubic (fcc) structure as their substrates and the (111) texture. The magnetic characteristics of films studied by a vibrating sample magnetometer (VSM) were found to vary depending on the type of the deposition (pulse or continuous) and the thickness of samples. The easy axis is in the film plane for all samples.