首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Iron films deposited on porous alumina substrates
Authors:Yasuhiro Yamada  Kenichi Tanabe  Naoki Nishida  Yoshio Kobayashi
Institution:1.Tokyo University of Science,Tokyo,Japan;2.The University of Electro-Communications,Tokyo,Japan;3.RIKEN,Saitama,Japan
Abstract:Iron films were deposited on porous alumina substrates using an arc plasma gun. The pore sizes (120 – 250 nm) of the substrates were controlled by changing the temperature during the anodic oxidation of aluminum plates. Iron atoms penetrated into pores with diameters of less than 160 nm, and were stabilized by forming γ-Fe, whereas α-Fe was produced as a flat plane covering the pores. For porous alumina substrates with pore sizes larger than 200 nm, the deposited iron films contained many defects and the resulting α-Fe had smaller hyperfine magnetic fields. In addition, only a very small amount of γ-Fe was obtained. It was demonstrated that the composition and structure of an iron film can be affected by the surface morphology of the porous alumina substrate on which the film is grown.
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号