19.6nm波长类氖锗X光激光光源理论模拟

 波长19.6nm的类氖锗X光激光适合作为诊断激光等离子体界面不稳定性的光源。用经过实验检验的系列程序对预-主短脉冲驱动类氖锗进行了系统的优化设计和理论分析。采用2%~3%的预脉冲强度，6~8ns的预-主脉冲时间间隔，在4×10¹³W/cm²功率密度驱动下, 波长19.6nm增益区的宽度可以超过60μm，增益区的维持时间可以达到90ps。对于16mm长的平板靶，增益系数可达11.8/cm；弯曲靶增益系数可达13.3/cm；单靶小增益长度积可达21.3，单靶就可以获得饱和增益。采用双靶对接，其小讯号增益可达38.4，可以获得深度饱和增益，能满足应用演示所需的X光激光光源。

Theoretical designs of 19.6nm Ne-like Ge XRL source

19.6nm Ne-like Ge X-ray laser (XRL) can be used as a source to diagnose Rayleigh-Taylor instability in laser induced plasma. In this paper, systemic optimum designs and theoretical analysis to Ne-like Ge XRL driven by pre-main short pulses were conducted by a series of codes, which had been tested by experiments. Simulation results show that, adopting driven conditions of 2%～3% pre-pulse , 6～8ns pre-main pulse interval and 40TW/cm~2 power intensity,a gain area of 19.6nm laser line beyond 60μm and gain duration of 90ps can be obtained. Furthermore, with 16mm plane target, the gain gets to 11.8/cm, and if 6mrad/cm curved target is adopted, it reaches to 13.3/cm, and small signal gain-length product gain-length product of single target is about 21.3, which means that saturated gain can be realized by a single target. With double targets opposite coupling, gain-length product can reach 38.4, deep saturation can be gotten, and XRL source required by demonstration of application is out of question.