| 离子注入掺杂锐钛矿TiO2薄膜的光学性能 |
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| 引用本文： | 常丹,陈猛,向霞,居勇峰,祖小涛.离子注入掺杂锐钛矿TiO2薄膜的光学性能[J].强激光与粒子束,2009,21(5). |
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| 作者姓名： | 常丹 陈猛 向霞 居勇峰 祖小涛 |
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| 作者单位： | 电子科技大学 应用物理系， 成都 610054 |
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| 基金项目： | 教育部高等学校博士学科点专项科研基金 |
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| 摘 要： | 在玻璃基体上，采用射频磁控溅射方法在不同的基体温度下制备了TiO2薄膜，然后在薄膜中注入注量分别为5×1016, 1×1017和5×1017/cm2的N离子以制备N掺杂的TiO2薄膜。X射线衍射结果表明：制备出的TiO2薄膜为锐钛矿型。X射线光电子能谱研究结果表明：注入的N离子与TiO2晶粒相互作用，形成了含氮的TiOxN2-x化合物，从而改变了TiO2薄膜的吸收边；随N离子注量增加，吸收边移动更明显；同时，由于氮离子注入产生的辐照缺陷使TiO2薄膜在紫外和可见光区的吸收也明显增强。
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| 关 键 词： | TiO2薄膜 锐钛矿 氮掺杂 离子注入 吸收光谱 射频磁控溅射 |
| 收稿时间： | 1900-01-01; |
Optical properties of N-doped anatase TiO2 films prepared by ion implantation |
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| CHANG Dan,CHEN Meng,XIANG Xia,JU Yongfeng,ZU Xiaotao.Optical properties of N-doped anatase TiO2 films prepared by ion implantation[J].High Power Laser and Particle Beams,2009,21(5). |
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| Authors: | CHANG Dan CHEN Meng XIANG Xia JU Yongfeng ZU Xiaotao |
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| Institution: | Department of Applied Physics, University of Electronic Science and Technology of China, Chengdu 610054, China |
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| Abstract: | Optical properties of N-doped anatase TiO2 films prepared by N ion implantation have been studied. At first, TiO2 films were prepared by RF magnetron sputtering at different substrate temperatures. Then N ion implantations in the films were conducted at fluences of 5×1016, 1×1017 and 5×1017/cm2, respectively. X-ray diffraction(XRD) results show TiO2 is anatase. X-ray photoelectron spectroscopy(XPS) results reveal that N ions interact with TiO2 particles and form TiOxN2-x compound, which leads to the shift of the absorption edge. Simultaneously, the irradiation defects caused by N ion implantation also increase the absorption intensity of TiO2 films in the range of UV-Visible light． |
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| Keywords: | anatase N doping ion implantation absorption spectrum RF magnetron sputtering |
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