化学法制备的HfO2薄膜的激光损伤阈值研究

 采用化学法制备了HfO₂介质膜，研究了热处理、紫外辐照以及Al₂O₃复合对HfO₂介质膜激光损伤阈值的影响。采用红外光谱（FTIR）和X射线衍射仪对薄膜进行了表征，并用输出波长为1.064 μm、脉宽为10 ns的电光调Q激光系统测试薄膜的激光损伤阈值。实验结果表明：采用150 ℃左右的温度对薄膜进行热处理可以提高薄膜的激光损伤阈值，所获得的薄膜的激光损伤阈值高达42.32 J/cm²，比热处理前的激光损伤阈值提高了82%；无机材料Al₂O₃的适量添加能够提高薄膜的激光损伤阈值，其中HfO₂与Al₂O₃的最佳质量配比约为95∶5；另外，对薄膜进行适当的紫外辐照也可改善HfO₂ 薄膜以及HfO₂-Al₂O₃复合薄膜的抗激光损伤性能。紫外辐照对提高HfO₂-Al₂O₃复合薄膜的激光损伤阈值效果尤为显著，辐照40 min后的激光损伤阈值达到44.33 J/cm²，比紫外辐照前的激光损伤阈值提高了90%。

Laser-induced damage threshold of hafnia thin films with chemical method

HfO2 thin films were prepared with chemical method. The influences of heat treatment, UV irradiation and addition of inorganic Al2O3 on laser-induced damage thresholds (LIDT) of HfO2 thin films were studied. HfO2 thin films were characterized by FTIR and X-ray diffraction. And 1-on-1 laser-induced damage threshold tests on HfO2 thin films and HfO2-Al2O3 composite films were carried out with a Q-switched Nd:YAG high power laser at 1 064 nm with a pulse width of 10 ns. The research results showed that the LIDT of the HfO2 thin films could be improved by heating the thin films at 150 ℃.The LIDT of the thin films heated at 150 ℃ was 42.32 J/cm2, which was 82% higher than that of the as-prepared samples. The addition of inorganic Al2O3 to the HfO2 thin films could also enhance the LIDT of thi