| 双离子束溅射沉积HfO2光学薄膜的研究 |
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| 引用本文： | 张文杰,彭玉峰,王建成,程祖海. 双离子束溅射沉积HfO2光学薄膜的研究[J]. 强激光与粒子束, 2007, 19(9): 1543-1546 |
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| 作者姓名： | 张文杰 彭玉峰 王建成 程祖海 |
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| 作者单位： | 1. 玉林师范学院 物理与信息科学系, 广西 玉林 537000;2. 河南师范大学 物理与信息工程学院， 河南 新乡 453007;3. 深圳市深新隆实业有限公司， 广东 深圳 518055;4. 华中科技大学 光电子科学与工程学院， 武汉 430074 |
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| 基金项目： | 国家重点基础研究发展计划(973计划) |
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| 摘 要： | 用双离子束溅射沉积氧化铪光学薄膜，并对此工艺下制备的氧化铪薄膜进行了光学性质、残余应力、结构特性以及激光损伤特性的研究。实验结果表明，用双离子束溅射沉积的氧化铪薄膜不仅结构均匀,膜层致密,无定形结构，而且具有极低的散射和吸收,均匀的非晶结构,杂质缺陷少,激光损伤阈值高。
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| 关 键 词： | 双离子束溅射沉积 氧化铪薄膜 激光损伤阈值 残余应力 |
| 文章编号： | 1001-4322（2007）09-1543-04 |
| 收稿时间： | 2006-11-16 |
| 修稿时间： | 2006-11-16 |
HfO2 optical films prepared by dual ion beam sputtering deposition |
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| ZHANG Wen-jie,PENG Yu-feng,WANG Jian-cheng,CHENG Zu-hai. HfO2 optical films prepared by dual ion beam sputtering deposition[J]. High Power Laser and Particle Beams, 2007, 19(9): 1543-1546 |
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| Authors: | ZHANG Wen-jie PENG Yu-feng WANG Jian-cheng CHENG Zu-hai |
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| Affiliation: | 1. Department of Physics and Information Science, Yulin Normal College, Yulin 537000, China;2. College of Physics and Information Engineering, He’nan Normal University, Xinxiang 453007, China;3. Shenzhen Shenxinlong Industry Co Ltd, Shenzhen 518055, China;4. School of Optoelectronics Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China |
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| Abstract: | HfO2 films have been deposited by dual-ion beam sputtering technology with starting material Hf.Optical,residual stress,structural properties and laser-induced damage threshold of the HfO2 films have been studied.It is found that the HfO2 shows uniform structural properties,film compact and structure and higher laser-induced damage threshold.The relation between structural and damage threshold of HfO2 films has also been studied. |
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| Keywords: | Dual ion beam sputtering deposition HfO2 films Laser-induced damage threshold Residual stress |
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