| Ti-Zr-V吸气剂薄膜在管道的制备与真空性能研究 |
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| 引用本文： | 朱邦乐,范乐,洪远志,王思慧,尉伟,王一刚,方键威,王勇.Ti-Zr-V吸气剂薄膜在管道的制备与真空性能研究[J].强激光与粒子束,2022,34(6):064005-1-064005-6. |
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| 作者姓名： | 朱邦乐 范乐 洪远志 王思慧 尉伟 王一刚 方键威 王勇 |
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| 作者单位： | 中国科学技术大学 国家同步辐射实验室，合肥 230026 |
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| 基金项目： | 国家自然科学基金项目(11975226,11905219)； |
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| 摘 要： | 利用直流磁控溅射方法在单晶硅片和内径为22 mm、长度分别为500 mm和1500 mm的银铜管道内壁镀制了Ti-Zr-V非蒸散型吸气剂薄膜，并对镀膜管道的极限真空进行了测量。结果显示:在180 ℃下激活24 h后，镀制了Ti-Zr-V薄膜真空管道的极限真空度可以达到9.2×10?10 Pa。在关闭测试系统和离子泵的阀门后，系统仅依靠Ti-Zr-V薄膜的吸气依然能够维持在9×10?9 Pa很长时间。利用测试粒子蒙特卡罗法对薄膜的抽速和容量进行了分析和测量，结果显示，Ti-Zr-V薄膜对CO的初始粘附系数最大可以达到0.3，容量可以达到1.2个分子层。
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| 关 键 词： | Ti-Zr-V薄膜 极限真空 磁控溅射 非蒸散型吸气剂薄膜 抽速测量 |
| 收稿时间： | 2021-11-09 |
Vacuum performance of Ti-Zr-V getter films deposited on narrow tubes |
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| Institution: | National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230026, China |
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| Abstract: | Non-evaporable getter films are widely used in particle accelerators. It has become an integral part of many particle accelerators. Ti-Zr-V films were deposited on Si substrates and straight and bent Ag-Cu tubes with an inner diameter of 22 mm by DC magnetron sputtering. After baked at 180 ℃ for 24 h, the ultimate vacuum of the coated tubes reached 9.2×10?10 Pa. The tubes with activated getter films maintained at 9×10?9 Pa after closing tubes and ion pump valve. The pumping speed and capacity of Ti-Zr-V films were measured by Test Particle Monte Carlo method. The results show that the best CO sticking probability reaches 0.3, with a pumping capacity of 1.2 monolayer. |
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