| 磁控溅射制备横向梯度分布的Mo/Si周期多层膜 |
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| 引用本文： | 涂昱淳,宋竹青,黄秋实,朱京涛,徐敬,王占山,李乙洲,刘佳琪,张力.磁控溅射制备横向梯度分布的Mo/Si周期多层膜[J].强激光与粒子束,2011,23(9). |
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| 作者姓名： | 涂昱淳 宋竹青 黄秋实 朱京涛 徐敬 王占山 李乙洲 刘佳琪 张力 |
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| 作者单位： | 1. 同济大学 物理系 精密光学工程技术研究所, 上海 200092；2. 中国运载火箭研究院 试验物理与计算数学实验室, 北京 100076 |
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| 基金项目： | 国家自然科学基金委员会-中国工程物理研究院联合基金项目(10876023); 国家自然科学基金项目(10905042); 上海市科委优秀学科带头人项目(09XD1404000); 科技部国际交流与合作专项项目(2008DFA01920) |
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| 摘 要： | 采用磁控溅射方法在Si基板上镀制了横向梯度分布的Mo/Si周期多层膜。以X射线掠入射反射测量了横向梯度多层膜的膜系结构，在基板65 mm长度范围内，多层膜周期从8.21 nm线性减小到6.57 nm，周期梯度为0.03 nm/mm。国家同步辐射实验室反射率计的反射率测试结果表明：该横向梯度分布周期多层膜上不同位置，能反射在13.3~15.9 nm波段范围内不同波长的极紫外光，反射率为60%~65%。
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| 关 键 词： | Mo/Si多层膜 磁控溅射 梯度多层膜 反射率 同步辐射 |
| 收稿时间： | 1900-01-01; |
Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology |
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| Tu Yuchun,Song Zhuqing,Huang Qiushi,Zhu Jingtao,Xu Jing,Wang Zhanshan,Li Yizhou,Liu Jiaqi,Zhang Li.Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology[J].High Power Laser and Particle Beams,2011,23(9). |
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| Authors: | Tu Yuchun Song Zhuqing Huang Qiushi Zhu Jingtao Xu Jing Wang Zhanshan Li Yizhou Liu Jiaqi Zhang Li |
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| Institution: | (1. Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092, China;2. Experimental Physics and Computational Mathematics Laboratory, China Academy of Launch Vehicle Technology, Beijing 100076, China) |
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| Abstract: | A laterally graded multilayer was deposited on silicon substrate by using magnetron sputtering.The d-spacing gradient of 0.03 nm/mm was achieved across a 65 mm long range on the substrate's surface,with d-spacing varying linearly from 8.41 nm to 6.57 nm,which was measured by grazing incidence X-ray reflection(GIXR).Extreme ultraviolet reflectivity was measured in National Synchrotron Radiation Laboratory(NSRL).The measured reflectivity is 60%~65% at the wavelength range of 13.3 to 15.9 nm. |
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| Keywords: | Mo/Si multilayer magnetron sputtering laterally graded multilayer reflectivity synchrotron radiation |
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