层间热处理对SiO2/ZrO2双层膜的影响

 以正硅酸乙酯和丙醇锆为前驱体,用溶胶-凝胶法在K9基片上提拉镀制SiO₂/ZrO₂双层膜。采用不同实验步骤制备了2个样品,样品1镀完SiO₂后直接镀ZrO₂ ，样品2镀完SiO₂经热处理后再镀ZrO₂。采用原子力显微镜、椭偏仪、紫外-可见分光光度计对薄膜进行表征。针对SiO₂/ZrO₂双层膜，考虑到膜间渗透的影响，采用３层Cauchy模型进行椭偏模拟，椭偏参数的模拟值曲线与椭偏仪的测量值曲线十分吻合，进而发现热处理可以使SiO₂/ZrO₂双层膜之间的渗透减少近23 nm，从而提高其峰值透射率。利用输出波长1.064 mm，脉宽8.1 ns的激光束对样品进行了损伤阈值的测试，用光学显微镜观察损伤形貌，结果发现两者损伤阈值分别为13.6 J/c2和14.18 J/cm²，均为膜的本征损伤。

Effect of inter-layer heat treatment on two-layer SiO2/ZrO2 films

Two-layer SiO2/ZrO2 thin films were deposited on K9 glass by Sol-Gel dip-coating method. The colloidal suspension of ZrO2 and SiO2 were prepared using Zr(OPr)4 and TEOS as precursors, respectively. For sample 1, the ZrO2 film was directly deposited on the pre-deposited SiO2 film. For sample 2, the ZrO2 film was deposited on the pre-deposited and heat-treated SiO2 film. Atomic force microscopy(AFM), ellipometry and UV-VIS spectroscopy were used to characterize the thin films. The samples were simulated with three-layer Cauchy theoretical model. The simulated ellipsometric parameters curves were perfectly consistent with the experimental ones. The results showed that the thickness of infiltrated layer of sample 2 was reduced by 23 nm by using heat treatment compared with that of sample 1. As