HfO_2单层膜的吸收和激光损伤阈值测试

薄膜吸收是降低膜层激光损伤阈值的重要原因,为了研究薄膜吸收对激光损伤阈值的影响,对HfO2单层膜在1 064 nm处的吸收及其在不同波长激光辐照下的损伤阈值进行了测试和分析。研究结果表明:薄膜的激光损伤阈值由薄膜吸收平均值(决定于薄膜中缺陷的种类和数量)和吸收均匀性(决定于薄膜中缺陷的分布)共同决定;根据HfO2单层膜在1064 nm波长处的吸收值,不但可以定性判断薄膜在1 064 nm波长,而且还可以判断在其它波长激光辐照下的抗激光损伤能力。

Absorption and laser-induced damage threshold of single-layer HfO2 film

The absorption of thin films is an important factor that reduces their laser induced damage threshold. The absorption at 1 064 nm and the laser-induced damage threshold at different wavelengths (1 064, 532, 355 nm) of single-layer HfO2 films were measured and analyzed. The results show that laser induced damage threshold is determined by the average value and uniformity of the film’s absorption, which depend on the type and quantity, and the distribution of defects in the film, respectively. The laser damage resistance of the single-layer HfO2 film irradiated at the three wavelengths (1 064, 532, 355 nm) can be deduced qualitatively by the measured absorption at 1 064 nm.