CH4/H2和CH4/He体系等离子体发射光谱分析

 在CH₄/H₂和CH₄/He和CH₄/He两种系统中，利用光学发射谱技术对螺旋波放电产生低压甲烷等离子体内活性粒子的光学发射特征进行了原位诊断。在实验中，两种体系下同时都测得的主要荷电粒子为CH,Ha,Hb,Hg以及H2等。研究了各实验参数对这些活性粒子CH, Ha,Hb以及Hg的发射光谱强度的影响。结果表明：在CH₄/H₂体系下，随着射频功率的增大，Ha,Hb,Hg以及CH基团的相对强度都随着增加，而当放电气压变化时它们都呈现先增大而后减小的趋势。在CH₄/He体系下，随射频功率的增加，Ha,Hb,Hg以及CH相对强度变化的总体趋势也都是先增加而后减小，当工作气压增加时，Ha,Hb以及Hg的相对强度变化也是呈现先增大而后减小，但CH基团的相对强度却是逐渐减小的；这些结果为等离子体沉积各种薄膜过程的理解及制备工艺参数的调整提供了参考。

Spectrum analysis of plasma in CH4/H2 and CH4/He systems

In methane-hydrogen and methane-helium systems, optical emission spectroscopy(OES) is used to diagnose the active species emission in the low-pressure methane plasma by spiral wave discharge. In experiments, the main species as H(Ha, Hb, Hg) and CH have been identified in the two systems. In CH4/He system, the intensities of these active species first increased and then decreased with the increase of the input RF power, and as the gas pressure increased, the intensity of the CH radical decreased, the intensities of Ha, Hb and Hg species initially increased and then decreased. In CH4/H2 system, the relative intensities of Ha, Hb, Hg and CH radicals increased with the increase of the input RF power, and the relative intensities of all these radicals initially increased and then decreased wit