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制备工艺对HfO2薄膜抗激光损伤能力的影响
引用本文:马平,柴林,邱服民,顾元元.制备工艺对HfO2薄膜抗激光损伤能力的影响[J].强激光与粒子束,2001,13(1):31-33.
作者姓名:马平  柴林  邱服民  顾元元
作者单位:成都精密光学工程研究中心,
基金项目:中国工程物理研究院科技基金资助项目(980230)
摘    要:采用反应蒸镀法镀制了单层HfO2薄膜,观察了薄膜表面主要的微结构缺陷,研究了基片清洗工艺对薄膜损伤阈值的影响。测量了薄膜沉积前后表面粗糙度变化。结果表明:沉积工艺可以改变粗糙度,并对薄膜抗激光损伤能力有较大的影响。

关 键 词:HfO2  薄膜  表面粗糙度  激光损伤
文章编号:1001-4322(2001)01-0031-03
收稿时间:2000/1/5
修稿时间:2000年1月5日

Influence of preparation process on laser induced damage threshold of HfO2
MA Ping.Influence of preparation process on laser induced damage threshold of HfO2[J].High Power Laser and Particle Beams,2001,13(1):31-33.
Authors:MA Ping
Abstract:A series of films were prepared by reactive evaporation. Themicrostructure defects on film surfaces and effect of substrate cleaning procedures on laser induced damage threshold were investigated. The RMS surface roughness of uncoated and coated substrates were measured. It was shown that the coating process could increase or decrease the surface roughness and had obvious effects on damage threshold.
Keywords:hafnia films  surface roughness  laser induced damage
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