| 不同线宽结构杂散光Kirk模型分析 |
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| 引用本文： | 黄振芬,曹益平,陈德良,武迎春.不同线宽结构杂散光Kirk模型分析[J].强激光与粒子束,2012,24(8):1775-1779. |
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| 作者姓名： | 黄振芬 曹益平 陈德良 武迎春 |
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| 作者单位： | 1.四川大学 电子信息学院, 成都 61 0065 |
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| 基金项目： | 国家高技术发展计划项目；国家重大专项基金项目(2009ZX02204-008)；四川省学术和技术带头人培养基金项目(07GRC-01) |
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| 摘 要： | 采用Kirk测量法的杂散光模型研究了杂散光在不同线宽结构上杂散光的光强变化，通过图像对比度分析了杂散光对不同线宽结构的影响。基于Matlab软件仿真分析表明:线宽一定时，线条越稀疏，图像对比度越低，杂散光对成像图形分辨力的影响越大；线条线间比一定时，线宽尺寸越小，图像对比度越低，杂散光对成像图形分辨力的影响也越大。所以杂散光对线宽较小并且线条稀疏空间结构所成的图形造成的影响较大。光刻； Kirk测量法； 杂散光； 点扩散函数； 图像对比度
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| 关 键 词： | 光刻 Kirk测量法 杂散光 点扩散函数 图像对比度 |
| 收稿时间： | 2012/2/17 |
Analyzing the effects of stray light to different critical dimension based on Kirk test |
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| Huang Zhenfen,Cao Yiping,Chen Deliang,Wu Yingchun.Analyzing the effects of stray light to different critical dimension based on Kirk test[J].High Power Laser and Particle Beams,2012,24(8):1775-1779. |
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| Authors: | Huang Zhenfen Cao Yiping Chen Deliang Wu Yingchun |
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| Institution: | 1.College of Electronics and Information Engineering,Sichuan University,Chengdu 610065,China |
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| Abstract: | Kirk’s stray light simulation model is adopted to study the variation of stray light on different line structures, and the effects of stray light for different line structures are analyzed by using image contrast. The simulation based on in-house image processing software written in MATLAB indicated that a sparser critical dimension would cause a lower image contrast and stronger effect on image pattern when the critical dimension is set. Otherwise, when the ratio of width and space is set, a smaller critical dimension would lead to a lower image contrast and stronger effect on image pattern. Therefore, the stray light has great influence on the image pattern of narrow and sparse lines structure. |
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| Keywords: | optical lithography Kirk test stray light point spread function image contrast |
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