| 多光束激光干涉光刻图样 |
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| 引用本文： | 张伟,刘维萍,顾小勇,谈春雷,彭长四.多光束激光干涉光刻图样[J].强激光与粒子束,2011,23(12):1-2. |
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| 作者姓名： | 张伟 刘维萍 顾小勇 谈春雷 彭长四 |
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| 作者单位： | 1.苏州大学 信息光学工程研究所, 江苏 苏州 21 5006; |
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| 基金项目： | 国家自然科学基金，江苏省高校优势学科建设工程资助项目，中国科学院SAFEA创新研究国际合作团队及欧盟第七研究框架LaserNaMi项目 |
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| 摘 要： | 利用电磁理论,研究了多光束激光干涉图样的产生原理,结合计算机数值模拟和相关实验结果,分析了干涉图样的影响因素.研究结果表明:多光束激光干涉图样可以看成是多组余弦分布的平行线条纹的叠加；相干光束的偏振方向、入射方向、光束间相位差是干涉图样的重要影响因素,改变这些因素,余弦分布的平行线条纹的振幅、位置、周期和方向发生变化,...
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| 关 键 词： | 微纳结构 纳米制造 激光干涉光刻 激光干涉图样 |
Multi-beam laser interference lithography pattern |
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| Zhang Wei
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Liu Weiping
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Gu Xiaoyong
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Tan Chunlei
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Peng Changsi.Multi-beam laser interference lithography pattern[J].High Power Laser and Particle Beams,2011,23(12):1-2. |
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| Authors: | Zhang Wei Liu Weiping Gu Xiaoyong Tan Chunlei Peng Changsi |
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| Institution: | 1.Institute of Informational Optical Engineering,Soochow University,Suzhou 215006,China;2.Opto-electronics Research Centre,Tampere University of Technology,Tampere 33720,Finland |
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| Abstract: | The principle of multi-beam laser interference lithography patterns was studied according to the electromagnetic theory. The factors affecting the patterns were analyzed by comparing numerical simulations with experimental results. It is found that multi-beam laser interference patterns can be considered as superpositions of multiple parallel stripes which are cosine distributed. The?beams’ polarization direction, incident direction and phase difference are important factors influencing the patterns, which affect the parallel stripes’ amplitude, location, period and orientation severely. |
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| Keywords: | nanofabrication laser interference lithography laser interference patterns |
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