| 磁控溅射法制备极紫外6.8～11.0nm波段Mo/B_4C横向梯度多层膜（英文） |
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| 引用本文： | 朱京涛,李淼,朱圣明,张嘉怡,冀斌,崔明启.磁控溅射法制备极紫外6.8～11.0nm波段Mo/B_4C横向梯度多层膜（英文）[J].强激光与粒子束,2018(6):16-20. |
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| 作者姓名： | 朱京涛 李淼 朱圣明 张嘉怡 冀斌 崔明启 |
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| 作者单位： | 同济大学物理科学与工程学院先进微结构材料教育部重点实验室;中国科学院高能物理研究所 |
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| 基金项目： | National Natural Science Foundation of China(11375131,U1432244);the Royal Society-NSFC International Exchanges Funding(IE141043,11511130051);the Fundamental Research Funds for Central Universities |
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| 摘 要： | 用直流磁控溅射法结合掩模板控制膜厚的方法在Si衬底上制备了工作于6.8～11.0nm波段的Mo/B_4C]60横向梯度多层膜。利用X射线掠入射反射测试以及同步辐射反射率测试对梯度多层膜的结构及性能进行了测试。X射线掠入射反射测试结果表明,多层膜周期厚度沿着长轴方向从4.39nm逐渐增加到7.82nm,周期厚度平均梯度为0.054nm/mm。对横向梯度多层膜沿长轴方向每隔5mm进行了一次同步辐射反射率测试,结果显示,横向梯度多层膜在45°入射角下的反射率约为10%,反射峰的半高全宽介于0.13nm到0.31nm之间。
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| 关 键 词： | 极紫外 横向梯度多层膜 Mo/B4C 磁控溅射 同步辐射 |
Laterally graded periodic Mo/B_4C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm |
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| Zhu Jingtao,Li Miao,Zhu Shengming,Zhang Jiayi,Ji Bin,Cui Mingqi.Laterally graded periodic Mo/B_4C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm[J].High Power Laser and Particle Beams,2018(6):16-20. |
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| Authors: | Zhu Jingtao Li Miao Zhu Shengming Zhang Jiayi Ji Bin Cui Mingqi |
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| Institution: | (MOE Key Laboratory of Advanced Micro structured Materials, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;Beijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China) |
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| Abstract: | Zhu Jingtao;Li Miao;Zhu Shengming;Zhang Jiayi;Ji Bin;Cui Mingqi(MOE Key Laboratory of Advanced Micro structured Materials, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;Beijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China) |
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| Keywords: | EUV laterally graded periodic multilayer Mo/B4C magnetron sputtering synchrotron radiation |
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