| 基于平板模型的X射线散射特性研究 |
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| 引用本文： | 刘进,刘军,李必勇,施将君.基于平板模型的X射线散射特性研究[J].强激光与粒子束,2006,18(1):173-176. |
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| 作者姓名： | 刘进 刘军 李必勇 施将君 |
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| 作者单位： | 中国工程物理研究院 流体物理研究所， 四川 绵阳 621900 |
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| 摘 要： | 为了进一步研究高能X光散射的特性，以平板为模型，通过解析方法和蒙特卡罗（MC）数值模拟研究了X光散射的规律。研究结果表明：高能X光的散射以康普顿散射为主，当平板厚度相应的X光光程小于2.0时，平板散射中的一次康普顿散射超过75%；当到达探测器的散射照射量最大时，平板厚度相应的X光光程介于1.0与2.0之间。
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| 关 键 词： | 闪光照相 散射 光程 平板 |
| 文章编号： | 1001-4322(2006)01-0173-04 |
| 收稿时间： | 2005-06-15 |
| 修稿时间： | 2005-10-18 |
Scatter law of flat model |
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| LIU Jin,LIU Jun,LI Bi-yong,SHI Jiang-jun.Scatter law of flat model[J].High Power Laser and Particle Beams,2006,18(1):173-176. |
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| Authors: | LIU Jin LIU Jun LI Bi-yong SHI Jiang-jun |
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| Institution: | Institute of Fluid Physics, CAEP, P.O.Box 919-105, Mianyang 621900, China |
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| Abstract: | A flat model is used to further study the scatter law in the X-ray radiography.The results are obtained with the analytic method and the MC simulations.One shows that in the radiography the Compton scatter is the dominant mode of interactions between the photon and the material and the first Compton scatter is more than 75 percent of the total scatter when the optical path of the flat is less than 2.0.And the analytic model is established effectively with the first Compton scatter approximation to the total.Another is that the same conclusion,which is the optical path of the flat is between 1.0 and 2.0 when the maximum scatter happens,is gained by analytic method,MC method with first Compton scatter and MC method with total scatter,respectively. |
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| Keywords: | Radiography Scatter Optical |
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