13.9 nm马赫贞德干涉仪用软X射线分束镜研究

 介绍了13.9 nm马赫贞德干涉仪用软X射线分束镜的设计、制备与性能检测。基于分束镜反射率和透过率乘积最大的评价标准，设计了13.9 nm软X射线激光干涉实验用多层膜分束镜。采用磁控溅射方法在有效面积为10 mm×10 mm、厚度为100 nm的Si3N4基底上镀制了Mo/Si多层膜，制成了多层膜分束镜。利用X射线掠入射衍射的方法测量了Mo/Si多层膜的周期。用扩束He-Ne激光束进行的投影成像方法定性分析了分束镜的面形精度，利用光学轮廓仪完成了分束镜面形精确测量。利用北京同步辐射装置测量了分束镜反射率和透射率，在13.9 nm处，分束镜反射率和透过率乘积达4%。使用多层膜分束镜构建了软X射线马赫贞德干涉仪，并应用于13.9 nm软X射线激光干涉实验中，获得了清晰的含有C8H8等离子体电子密度信息的动态干涉条纹。

Multilayer beam splitter used in a soft X-ray Mach-Zehnder interferometer at working wavelength of 13.9 nm

The soft X-ray Mach-Zehnder interferometer is an important tool in measuring the electron densities of laser-produced plasma near the critical surface. The design, fabrication and characterization of multilayer beam splitters at 13.9 nm for soft X-ray Mach-Zehnder interferometer are presented in the paper. The design of beam splitter is completed based on the standard of maximizing product of reflectivity and transmission of the beam splitter at 13.9 nm. The beam splitters, which are Mo/Si multilayer deposited on 10 mm×10 mm area, 100 nm thickness Si3N4 membranes, are fabricated using the magnetron sputtering. A method based on extended He-Ne laser beam is developed to analyze the figure error of the beam splitters. The data measured by an optical profiler prove that the method based on v